Speakers

Conference Themes	Plenary Speakers	Program Overview	Invited Speakers

Plenary Speakers

	Relaxor-PT Single Crystals: There and Back Again Thomas R. SHROUT The Pennsylvania State University, USA
	The New Era of Correlated Electron Devices Carlos Paz de ARAUJO University of Colorado-Colorado Springs, and Symetrix Corporation, USA
	The Current Status of Single Crystalline Nanocube Materials Kazumi KATO National Institute of Advanced Industrial Science and Technology (AIST), Japan
	Cooperative Function in Atomically Precise Nanoscale Assemblies Paul S. WEISS University of California, Los Angeles, USA
	Mapping Electric Dipole Moments in Oxide Ferroelectrics Chunlin JIA Institute of Microstructure Research and Ernst Ruska-Centre for Microscopy and Spectroscopy with Electrons, Forschungszentrum Jülich, Germany, and Xi’an Jiaotong University, China
	Next-Generation Ferroelectric Memories Based on X:HfO2 Stefan MUELLER NaMLab gGmbH, Germany

Invited Speakers

Dinesh AGRAWAL, Penn state University, USA
Koichi BANNO, Murata, Japan
Markys CAIN, National Physical Laboratory, UK
Jun CHEN, University of Science and Technology in Beijing, China
John DANIELS, The University of New South Wales (UNSW), Australia
Sandwip DEY, Arizona State University, USA
Steve DUNN, Queen Mary University of London (SEMS-QMUL), UK
Donglei Emma FAN, University of Texas at Austin, USA
Hiroshi FUNAKUBO, Tokyo Institute of Technology, Japan
Alexei GRUVEMAN, University of Nebraska-Lincoln, USA
Yoshikazu HISHINUMA, Fujifilm, Japan
Dean HO, University of California, Los Angeles, USA
Timothy J. JACKSON, University of Birmingham, UK
Heli JANTUNEN, University of Oulu Finland, Finland
Thottam KALKUR, University of Colorado-Colorado Springs, USA
Ram KATIYAR, University of Puerto Rico, Puerto Rico
Martin LANE, University of California-Berkeley, USA
Geunhee LEE, University of Texas at Dallas, USA
Igor LEVIN, National Institute of Standards and Technology (NIST), USA
Jing-Feng LI, Tsinghua University, China
Leong Chew LIM, National University of Singapore, Singapore
Haosu LUO, Shanghai Institute of Ceramics, Chinese Academy of Sciences, China
Tso-Ping MA, Yale School of Engineering, USA
Barbara MALIC, Josef Stefan Institute, Slovenia
Ce-Wen NAN, Tsinghua University, China
Nagaya OKADA, Honda Electronics Co., Ltd. Japan
Xiaoqing PAN, University of Michigan, USA
Roger PROKSCH, Asylum Research, Oxford Instruments, UK
Wei REN, Xi’an Jiaotong University, China
Brian RODRIGUEZ, UCD, Ireland
Juergen ROEDEL, TU-Darmstadt, Germany
Rodney RUOFF, Ulsam Institute of Science and Technology, Korea
Uwe SCHROEDER, NaMLabs, Germany
Nava SETTER, EPFL, Switzerland
Tomas SLUKA, EPFL, Switzerland
Igor STOLICHNOV, EPFL, Switzerland
Susan TROLIER-McKINSTRY, The Pennsylvania State University, USA
Takaaki TSURUMI, Tokyo Institute of Technology, Japan
Rama VASUDEVAN, ORNL, USA
Satoshi WADA, University of Yamanashi, Japan
Hong WANG, Xi’an Jiaotong University, China
John WANG, National University of Singapore
Junling WANG, Nanyang Technological University, Singapore
Zhihong WANG, King Abdullah University of Science and Technology, Saudi Arabia
Jo WOOK, Ulsan National Institute of Science and Technology, Korea
Qifa ZHOU, University of Southern California, USA